Profile
Michél Simon-Najasek, team leader »Physical Failure Analysis«, deputy group leader »Semiconductor Diagnostics«
Main areas of research
- Semiconductor technologies based on silicon and III-V semiconductor devices
- Clarification of process- and application-related structural and electrical defect mechanisms with a focus on automotive electronics (complete analysis chain via defect localization, preparation and analysis)
- Evaluation of degradation mechanisms of GaN-based HEMT transistors
- Further development of diagnostics-specific preparation and analysis methods
- High-resolution structural and chemical analysis at semiconductor level in research and development
Career
Since 03/2017
Team leader “Physical failure analysis”, Fraunhofer IMWS
Since 01/2012
Deputy Group Leader “Semiconductor Diagnostics”, Fraunhofer IMWS
Since 2003
Work at the Fraunhofer IMWS in the field of IC diagnostics
1998 - 2002
Studied electrical engineering at Köthen University of Applied Sciences, specializing in electrical and environmental engineering (ETU)
2000 - 2001
One year of study at Coventry University in Great Britain as part of an exchange program (Bachelor of Engineering degree)
Prizes and awards
2019
Best Paper Award of the IEEE International Reliability Physics Symposium (IRPS) for “New Access to Soft Breakdown Parameters of Low-k Dielectrics Through Localization-Based Analysis” (together with other authors)
2018
Supplier Award of the company Micronas-TDK (together with Frank Altmann)
2016
Best Paper of the ESREF Best Paper Award Committee for “Correlation of gate leakage and local strain distribituion in GaN/AlGaN HEMT structures” (together with Andreas Graff, David Poppitz and Frank Altmann)
2014
Outstanding Paper of the 40th International Symposium on Testing and Failure Analysis (ISTFA) for “Advanced FIB sample preparation techniques for high resolution TEM investigations of HEMT device structures” (together with Frank Altmann and Jörg Jatzkowski)
2014
Best Paper of the ESREF Best Paper Award Committee for “Advanced FIB sample preparation techniques for high resolution TEM investigations of HEMT device structures” (together with Frank Altmann, Susanne Hübner and Andreas Graff)
2002
Karl-Hermann Zipp Prize of the Köthen University of Applied Sciences for graduating as the best student of the year in the Department of Electrical Engineering
Publications
Selected articles in journals with scientific quality control
Local metal segregation as a cause of electrical short circuits in highly doped pressure sensorsM. Simon-Najasek, P. Diehle, Ch. Große, S. Hübner, G. Brokmann, B. Sprenger, F. Altmann
Reliability in microelectronics 127 (2021)
Adaptive covalent low-temperature bonding of III-nitride thin films by extremely thin water interlayers
Gerrer, T.; Graff, A.; Simon-Najasek, M.; Czap, H.; Maier, T.; Benkhelifa, F.; Müller, S.; Nebel, C. E.; Waltereit, P.; Quay, R.; Cimalla, V.
Applied Physics Letters 114 (2019), no.25, art. 252103, 5 p.
Novel failure mode of chip corrosion on automotive HALL sensors under different loading conditions
Simon-Najasek, M.; Lorenz, G.; Lindner, A.; Altmann, F.
Microelectronics Reliability 64 (2016), p.248-253
Correlation of gate leakage and local stress distribution in GaN/AlGaN HEMT structures
Broas, M.; Graff, A.; Simon-Najasek, M.; Poppitz, D.; Altmann, F.; Jung, H.; Blanck, H.
Microelectronics Reliability 64 (2016), p.541-546
Advanced FIB sample preparation techniques for high-resolution TEM investigations of HEMT structures
Simon-Najasek, M.; Huebner, S.; Altmann, F.; Graff, A.
Microelectronics Reliability 54 (2014), No.9-10, pp.1785-1789